Flat metallic surface gratings with sub-10 nm gaps controlled by atomic-layer deposition

Borui Chen, Dengxin Ji, Alec Cheney, Nan Zhang, Haomin Song, Xie Zeng, Tim Thomay, Qiaoqiang Gan, Alexander Cartwright

Research output: Contribution to journalArticlepeer-review

11 Scopus citations


Atomic layer lithography is a recently reported new technology to fabricate deep-subwavelength features down to 1-2 nm, based on combinations of electron beam lithography (EBL) and atomic layer deposition (ALD). However, the patterning area is relatively small as limited by EBL, and the fabrication yield is not very high due to technical challenges. Here we report an improved procedure to fabricate flat metallic surfaces with sub-10 nm features based on ALD processes. To demonstrate the scalability of the new manufacturing method, we combine the ALD process with large area optical interference patterning, which is particularly promising for the development of practical applications for nanoelectronics and nanophotonics with extremely strong confinement of electromagnetic fields.
Original languageEnglish (US)
Issue number37
StatePublished - Aug 9 2016
Externally publishedYes

Bibliographical note

Generated from Scopus record by KAUST IRTS on 2022-09-13

ASJC Scopus subject areas

  • Bioengineering
  • Mechanics of Materials
  • General Materials Science
  • General Chemistry
  • Mechanical Engineering
  • Electrical and Electronic Engineering


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