Flat metallic surface gratings with sub-10 nm gaps controlled by atomic-layer deposition

Borui Chen, Dengxin Ji, Alec Cheney, Nan Zhang, Haomin Song, Xie Zeng, Tim Thomay, Qiaoqiang Gan, Alexander Cartwright

Research output: Contribution to journalArticlepeer-review

10 Scopus citations

Abstract

Atomic layer lithography is a recently reported new technology to fabricate deep-subwavelength features down to 1-2 nm, based on combinations of electron beam lithography (EBL) and atomic layer deposition (ALD). However, the patterning area is relatively small as limited by EBL, and the fabrication yield is not very high due to technical challenges. Here we report an improved procedure to fabricate flat metallic surfaces with sub-10 nm features based on ALD processes. To demonstrate the scalability of the new manufacturing method, we combine the ALD process with large area optical interference patterning, which is particularly promising for the development of practical applications for nanoelectronics and nanophotonics with extremely strong confinement of electromagnetic fields.
Original languageEnglish (US)
JournalNanotechnology
Volume27
Issue number37
DOIs
StatePublished - Aug 9 2016
Externally publishedYes

ASJC Scopus subject areas

  • Bioengineering
  • Mechanics of Materials
  • Materials Science(all)
  • Chemistry(all)
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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