Fast non-contact surface roughness measurements up to the micrometer range by dual-wavelength digital holographic microscopy

Jonas Kühn; Eduardo Solanas; Sébastien Bourquin; Jean François Blaser; Luca Dorigatti; Thierry Keist; Yves Emery; Christian Depeursinge

doi:10.1117/12.854550

Fast non-contact surface roughness measurements up to the micrometer range by dual-wavelength digital holographic microscopy

Jonas Kühn^*, Eduardo Solanas, Sébastien Bourquin, Jean François Blaser, Luca Dorigatti, Thierry Keist, Yves Emery, Christian Depeursinge

^*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

2 Scopus citations

Abstract

We present fast high-roughness and non-contact surface measurements by digital holographic microscopy (DHM). By using single- and dual-wavelength operation modes, coupled with advanced image stitching and non-measured points management methods, the technique enables two-dimensional roughness measurements up to the micrometer (N6). The sample is mechanically scanned over a surface up to 5 × 0.3 mm² with 17 holograms each acquired in less than 500 μs, the corresponding phase images stitched together by software, and therefore providing multiple profiles measurement in the ISO definition in less than 30 s. The approach is validated by inspection of several different roughness standards and our technique is demonstrated to be in agreement with two existing well-known techniques in the field.

Original language	English (US)
Title of host publication	Optical Micro- and Nanometrology III
Volume	7718
DOIs	https://doi.org/10.1117/12.854550
State	Published - 2010
Externally published	Yes
Event	Optical Micro- and Nanometrology III - Brussels, Belgium Duration: Apr 13 2010 → Apr 16 2010

Other

Other	Optical Micro- and Nanometrology III
Country/Territory	Belgium
City	Brussels
Period	04/13/10 → 04/16/10

Keywords

digital holography
interferometry
microscopy
phase imaging
surface metrology
Surface roughness

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

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10.1117/12.854550

Cite this

@inproceedings{65e5070f723c4aa4807cf917a27acd71,

title = "Fast non-contact surface roughness measurements up to the micrometer range by dual-wavelength digital holographic microscopy",

abstract = "We present fast high-roughness and non-contact surface measurements by digital holographic microscopy (DHM). By using single- and dual-wavelength operation modes, coupled with advanced image stitching and non-measured points management methods, the technique enables two-dimensional roughness measurements up to the micrometer (N6). The sample is mechanically scanned over a surface up to 5 × 0.3 mm2 with 17 holograms each acquired in less than 500 μs, the corresponding phase images stitched together by software, and therefore providing multiple profiles measurement in the ISO definition in less than 30 s. The approach is validated by inspection of several different roughness standards and our technique is demonstrated to be in agreement with two existing well-known techniques in the field.",

keywords = "digital holography, interferometry, microscopy, phase imaging, surface metrology, Surface roughness",

author = "Jonas K{\"u}hn and Eduardo Solanas and S{\'e}bastien Bourquin and Blaser, {Jean Fran{\c c}ois} and Luca Dorigatti and Thierry Keist and Yves Emery and Christian Depeursinge",

year = "2010",

doi = "10.1117/12.854550",

language = "English (US)",

isbn = "9780819481917",

volume = "7718",

booktitle = "Optical Micro- and Nanometrology III",

note = "Optical Micro- and Nanometrology III ; Conference date: 13-04-2010 Through 16-04-2010",

}

Kühn, J, Solanas, E, Bourquin, S, Blaser, JF, Dorigatti, L, Keist, T, Emery, Y & Depeursinge, C 2010, Fast non-contact surface roughness measurements up to the micrometer range by dual-wavelength digital holographic microscopy. in Optical Micro- and Nanometrology III. vol. 7718, 771805, Optical Micro- and Nanometrology III, Brussels, Belgium, 04/13/10. https://doi.org/10.1117/12.854550

TY - GEN

T1 - Fast non-contact surface roughness measurements up to the micrometer range by dual-wavelength digital holographic microscopy

AU - Kühn, Jonas

AU - Solanas, Eduardo

AU - Bourquin, Sébastien

AU - Blaser, Jean François

AU - Dorigatti, Luca

AU - Keist, Thierry

AU - Emery, Yves

AU - Depeursinge, Christian

PY - 2010

Y1 - 2010

N2 - We present fast high-roughness and non-contact surface measurements by digital holographic microscopy (DHM). By using single- and dual-wavelength operation modes, coupled with advanced image stitching and non-measured points management methods, the technique enables two-dimensional roughness measurements up to the micrometer (N6). The sample is mechanically scanned over a surface up to 5 × 0.3 mm2 with 17 holograms each acquired in less than 500 μs, the corresponding phase images stitched together by software, and therefore providing multiple profiles measurement in the ISO definition in less than 30 s. The approach is validated by inspection of several different roughness standards and our technique is demonstrated to be in agreement with two existing well-known techniques in the field.

AB - We present fast high-roughness and non-contact surface measurements by digital holographic microscopy (DHM). By using single- and dual-wavelength operation modes, coupled with advanced image stitching and non-measured points management methods, the technique enables two-dimensional roughness measurements up to the micrometer (N6). The sample is mechanically scanned over a surface up to 5 × 0.3 mm2 with 17 holograms each acquired in less than 500 μs, the corresponding phase images stitched together by software, and therefore providing multiple profiles measurement in the ISO definition in less than 30 s. The approach is validated by inspection of several different roughness standards and our technique is demonstrated to be in agreement with two existing well-known techniques in the field.

KW - digital holography

KW - interferometry

KW - microscopy

KW - phase imaging

KW - surface metrology

KW - Surface roughness

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U2 - 10.1117/12.854550

DO - 10.1117/12.854550

M3 - Conference contribution

AN - SCOPUS:77953879560

SN - 9780819481917

VL - 7718

BT - Optical Micro- and Nanometrology III

T2 - Optical Micro- and Nanometrology III

Y2 - 13 April 2010 through 16 April 2010

ER -

Fast non-contact surface roughness measurements up to the micrometer range by dual-wavelength digital holographic microscopy

Abstract

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Keywords

ASJC Scopus subject areas

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