Abstract
Silicon micromachining is an attractive technique for a wide class of miniaturized components and systems. We have designed and fabricated several self-standing devices based on surface and bulk micromachining techniques. Our process makes use of Silicon Nitride membranes, which are patterned by electron beam (e-beam) lithography and removed after pattern metallization by reactive ion etching. The fabricated microstructures can be moved and adjusted by electromagnetic actuation.
Original language | English (US) |
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Pages (from-to) | 161-164 |
Number of pages | 4 |
Journal | Microelectronic Engineering |
Volume | 46 |
Issue number | 1 |
DOIs | |
State | Published - May 1999 |
Externally published | Yes |
Event | Proceedings of the 1998 International Conference on Micro- and Nanofabrication (MNE98) - Leuven Duration: Sep 22 1998 → Sep 24 1998 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
- Surfaces, Coatings and Films
- Electrical and Electronic Engineering