Abstract
The fabrication and investigation of low dimensional semiconductor nanostructures have received increasing attention in recent years. The quasi one- and zero-dimensional structures have shown improved optical and electrical properties that increase device performance and enable development of novel devices. Many technological approaches have been developed to define ultrasmall semiconductor structures as in quantum wire and quantum dot fabrication. In this paper, a method based on electron beam interference, for nanostructures fabrication is proposed. Nanoscale wires or gratings, as well as dots, are generated using this method which is simple, maskless and of high throughput.
Original language | English (US) |
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Title of host publication | CLEO/Pacific Rim 1999 - Pacific Rim Conference on Lasers and Electro-Optics |
Publisher | Institute of Electrical and Electronics Engineers Inc. |
Pages | 314-315 |
Number of pages | 2 |
ISBN (Electronic) | 0780356616, 9780780356610 |
DOIs | |
State | Published - 1999 |
Externally published | Yes |
Event | 1999 Pacific Rim Conference on Lasers and Electro-Optics, CLEO/Pacific Rim 1999 - Seoul, Korea, Republic of Duration: Aug 30 1999 → Sep 3 1999 |
Publication series
Name | CLEO/Pacific Rim 1999 - Pacific Rim Conference on Lasers and Electro-Optics |
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Volume | 2 |
Other
Other | 1999 Pacific Rim Conference on Lasers and Electro-Optics, CLEO/Pacific Rim 1999 |
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Country/Territory | Korea, Republic of |
City | Seoul |
Period | 08/30/99 → 09/3/99 |
Bibliographical note
Publisher Copyright:© 1999 IEEE.
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Computer Networks and Communications
- General Physics and Astronomy