@article{15ad50f4a5454eaca949429b2a72af2b,
title = "Evolution of Filament Formation in Ni/HfO 2 /SiO x /Si-Based RRAM Devices",
author = "Xing Wu and Sen Mei and Michel Bosman and Nagarajan Raghavan and Xixiang Zhang and Cha, \{Dong Kyu\} and Kun Li and Pey, \{Kin Leong\}",
note = "KAUST Repository Item: Exported on 2020-10-01 Acknowledgements: Singapore University of Technology and Design (SUTD)-Zhejiang University (ZJU) Research Collaboration[ZJURP1300104]",
year = "2015",
month = oct,
day = "9",
doi = "10.1002/aelm.201500130",
language = "English (US)",
volume = "1",
pages = "1500130",
journal = "Advanced Electronic Materials",
issn = "2199-160X",
publisher = "John Wiley and Sons Inc.",
number = "11",
}