Enhancement of spin-dependent scattering and improvement of microstructure in spin valves by delayed deposition

D. Z. Yang, L. Wang, X. J. Yang, S. M. Zhou*, X. S. Wu, J. Du, A. Hu, X. X. Zhang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Abstract

Si/Ta/Co/Cu/CoFeMn (or NiO) spin valves were prepared by a delayed sputtering procedure, in which depositions of Ta and followed layers were intervened by 1 h. The spin valves are found to have better coherent growth with stronger (111) preferred orientations in Co and Cu layers, compared with the traditional continuous method. At the same time, the giant magnetoresistance ratio and spin-dependent scattering are enhanced by a factor of 20%-30%. These results indicate that the coherent growth and the (111) preferred orientation can enhance the spin-dependent scattering of spin valves.

Original languageEnglish (US)
Article number252503
Pages (from-to)1-3
Number of pages3
JournalApplied Physics Letters
Volume86
Issue number25
DOIs
StatePublished - 2005
Externally publishedYes

Bibliographical note

Funding Information:
This work was supported by the National Science Foundation of China Grant Nos. 10174014, 60271013, 10021001, 10321003, and 60490290, and the State Key Project of Fundamental Research Grant Nos. 2001CB610602 and 2002CB613504.

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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