Electron cyclotron resonance plasma etching of InP through-wafer connections at >4 μm/min using Cl2/Ar

Y. W. Chen*, Boon Ooi, G. I. Ng, C. L. Tan

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Fingerprint

Dive into the research topics of 'Electron cyclotron resonance plasma etching of InP through-wafer connections at >4 μm/min using Cl2/Ar'. Together they form a unique fingerprint.

Engineering & Materials Science