Electron-beam study of nanometer performances of the SAL 601 chemically amplified resist

Keyphrases

• Writing Strategies 50%
• Exposure Latitude 50%
• Baking Time 50%
• Test Pattern 50%
• Baking Temperature 50%
• Resist Process 50%
• Thick Resist 50%
• Electron Beam Exposure 50%
• Accelerating Voltage 50%
• Test Use 50%
• Nominal Attributes 50%

Engineering

• Nanometre 100%
• Feature Size 100%
• Process Parameter 50%
• Accelerating Voltage 50%