Electron-beam lithography patterning of magnetic nickel films

A. Gerardino; E. Di Fabrizio; A. Nottola; S. Cabrini; G. Giannini; L. Mastrogiacomo; G. Gubbiotti; P. Candeloro; G. Carlotti

doi:10.1016/S0167-9317(01)00474-9

Electron-beam lithography patterning of magnetic nickel films

A. Gerardino, E. Di Fabrizio, A. Nottola, S. Cabrini, G. Giannini, L. Mastrogiacomo, G. Gubbiotti, P. Candeloro, G. Carlotti

Research output: Contribution to journal › Article › peer-review

10 Scopus citations

Abstract

Electron beam (e-beam) lithography has been used to fabricate arrays of rectangular and triangular shaped nickel dots. Dot dimensions range from 250 nm to 1 μm with separations of sub 100, 100 and 250 nm. The array dimensions are about 1 mm². X-ray masks to perform the dot patterning by X-ray lithography have been fabricated too. The whole lithographic process is described together with preliminary results concerning the magnetic characterisation of the patterned structures.

Original language	English (US)
Pages (from-to)	931-937
Number of pages	7
Journal	Microelectronic Engineering
Volume	57-58
DOIs	https://doi.org/10.1016/S0167-9317(01)00474-9
State	Published - Sep 2001
Externally published	Yes

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Surfaces, Coatings and Films
Electrical and Electronic Engineering

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10.1016/S0167-9317(01)00474-9

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title = "Electron-beam lithography patterning of magnetic nickel films",

abstract = "Electron beam (e-beam) lithography has been used to fabricate arrays of rectangular and triangular shaped nickel dots. Dot dimensions range from 250 nm to 1 μm with separations of sub 100, 100 and 250 nm. The array dimensions are about 1 mm2. X-ray masks to perform the dot patterning by X-ray lithography have been fabricated too. The whole lithographic process is described together with preliminary results concerning the magnetic characterisation of the patterned structures.",

author = "A. Gerardino and {Di Fabrizio}, E. and A. Nottola and S. Cabrini and G. Giannini and L. Mastrogiacomo and G. Gubbiotti and P. Candeloro and G. Carlotti",

year = "2001",

month = sep,

doi = "10.1016/S0167-9317(01)00474-9",

language = "English (US)",

volume = "57-58",

pages = "931--937",

journal = "Microelectronic Engineering",

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TY - JOUR

T1 - Electron-beam lithography patterning of magnetic nickel films

AU - Gerardino, A.

AU - Di Fabrizio, E.

AU - Nottola, A.

AU - Cabrini, S.

AU - Giannini, G.

AU - Mastrogiacomo, L.

AU - Gubbiotti, G.

AU - Candeloro, P.

AU - Carlotti, G.

PY - 2001/9

Y1 - 2001/9

N2 - Electron beam (e-beam) lithography has been used to fabricate arrays of rectangular and triangular shaped nickel dots. Dot dimensions range from 250 nm to 1 μm with separations of sub 100, 100 and 250 nm. The array dimensions are about 1 mm2. X-ray masks to perform the dot patterning by X-ray lithography have been fabricated too. The whole lithographic process is described together with preliminary results concerning the magnetic characterisation of the patterned structures.

AB - Electron beam (e-beam) lithography has been used to fabricate arrays of rectangular and triangular shaped nickel dots. Dot dimensions range from 250 nm to 1 μm with separations of sub 100, 100 and 250 nm. The array dimensions are about 1 mm2. X-ray masks to perform the dot patterning by X-ray lithography have been fabricated too. The whole lithographic process is described together with preliminary results concerning the magnetic characterisation of the patterned structures.

UR - http://www.scopus.com/inward/record.url?scp=0035450505&partnerID=8YFLogxK

U2 - 10.1016/S0167-9317(01)00474-9

DO - 10.1016/S0167-9317(01)00474-9

M3 - Article

AN - SCOPUS:0035450505

SN - 0167-9317

VL - 57-58

SP - 931

EP - 937

JO - Microelectronic Engineering

JF - Microelectronic Engineering

ER -

Electron-beam lithography patterning of magnetic nickel films

Abstract

ASJC Scopus subject areas

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