Electrical bias stressing and radiation induced charge trapping in HfO 2/SiO2 dielectric stacks

R. A.B. Devine*, T. Busani, Manuel Quevedo-Lopez, Husam Niman Alshareef

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

7 Scopus citations

Fingerprint

Dive into the research topics of 'Electrical bias stressing and radiation induced charge trapping in HfO 2/SiO2 dielectric stacks'. Together they form a unique fingerprint.

INIS

Engineering

Physics

Medicine and Dentistry

Material Science

Mathematics