Keyphrases
Silica
100%
Cleaning Methods
100%
Wafer
100%
Chemical Analysis
100%
Friction Characteristics
100%
UV-ozone
66%
Ammonia
33%
Microstructure
33%
Contact Angle
33%
Atomic Force Microscopy
33%
Silicon Wafer
33%
Surface Roughness
33%
Hydrogen Peroxide
33%
Atomic Scale
33%
Friction Coefficient
33%
Force Interaction
33%
Lateral Force Microscopy
33%
Mixture Solution
33%
Plasma Cleaning
33%
Organic Contamination
33%
Silicon Oxide Layer
33%
Wet Cleaning
33%
Water Vapor Plasma
33%
Thermal Silicon Oxide
33%
Topological Difference
33%
Engineering
Oxide Layer
100%
Microstructure
100%
Cleaning Procedure
100%
Friction Coefficient
100%
Normal Force
100%
Lateral Force
100%
Atomic Force Microscopy
100%
Silicon Wafer
100%
Silicon Oxide
100%
Material Science
Silicon Wafer
100%
Surface Roughness
100%
Contact Angle
100%
Water Vapor
100%
Oxide Compound
100%
Hydrogen Peroxide
100%