Effects of ALD TiN metal gate thickness on metal gate /high-k dielectric SOI FinFET characteristics

C. Y. Kang, R. Choi, S. C. Song, B. S. Ju, Muhammad Mustafa Hussain, B. H. Lee, J. W. Yang, P. Zeitzoff, D. Pham, W. Xiong, H. H. Tseng

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

10 Scopus citations

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