Effective N-methyl-2-pyrrolidone wet cleaning for fabricating high-performance monolayer MoS2 transistors

Po-Chun Chen, Chih-Pin Lin, Chuan-Jie Hong, Chih-Hao Yang, Yun-Yan Lin, Ming-Yang Li, Lain-Jong Li, Tung-Yuan Yu, Chun-Jung Su, Kai-Shin Li, Yuan-Liang Zhong, Tuo-Hung Hou, Yann-Wen Lan

Research output: Contribution to journalArticlepeer-review

13 Scopus citations


Two-dimensional semiconductors, such as MoS2 are known to be highly susceptible to diverse molecular adsorbates on the surface during fabrication, which could adversely affect device performance. To ensure high device yield, uniformity and performance, the semiconductor industry has long employed wet chemical cleaning strategies to remove undesirable surface contaminations, adsorbates, and native oxides from the surface of Si wafers. A similarly effective surface cleaning technique for two-dimensional materials has not yet been fully developed. In this study, we propose a wet chemical cleaning strategy for MoS2 by using N-methyl-2-pyrrolidone. The cleaning process not only preserves the intrinsic properties of monolayer MoS2, but also significantly improves the performance of monolayer MoS2 field-effect-transistors. Superior device on current of 12 μA·μm–1 for a channel length of 400 nm, contact resistance of 15 kΩ·μm, field-effect mobility of 15.5 cm2·V–1·s–1, and the average on–off current ratio of 108 were successfully demonstrated
Original languageEnglish (US)
Pages (from-to)303-308
Number of pages6
JournalNano Research
Issue number2
StatePublished - Oct 5 2018

Bibliographical note

KAUST Repository Item: Exported on 2020-10-01
Acknowledgements: Thanks for the fruitful discussion with Dr. Yao-Jen Lee, and Yi-Ling Jian. This work was supported by the “National Science Council” under contract No. MOST 105-2112-M-003-016-MY3. This work was also in part supported by the “National Nano Device Laboratories”.


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