Abstract
The effect of growth conditions on the Al composition and optical properties of AlxGa1-xN layers grown by atmospheric-pressure metal organic vapor phase epitaxy is investigated. The Al content of the samples is varied between 3.0% and 9.3% by changing the gas flow rate of either trimethylaluminum (TMA) or trimethylgallium (TMG) while other growth parameters are kept constant. The optical properties of the AlxGa1-xN layers are studied by photoreflectance and time-resolved photoluminescence (TR-PL) spectroscopies. A degeneration in the material quality of the samples is revealed when the Al content is increased by increasing the TMA flow rate. When the TMG flow rate is decreased with a fixed TMA flow rate, the Al content of the AlxGa1-xN layers is increased and, furthermore, an improvement in the optical properties corresponding with an increase in the PL decay time is observed. (C) 2017 Elsevier B.V. All rights reserved.
Original language | English (US) |
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Pages (from-to) | 2-2 |
Number of pages | 1 |
Journal | Thin Solid Films |
Volume | 630 |
DOIs | |
State | Published - Feb 17 2017 |
Bibliographical note
KAUST Repository Item: Exported on 2019-02-13Acknowledgements: Financial support from the Tunisian General Directorate of Scientific and Technical Research (DGRST) is gratefully acknowledged. The authors would like to thank Prof. Dr. Martin Koch of the Physics Department of the Philipp University of Marburg for giving the opportunity to perform the time-resolved photoluminescence measurements in his laboratories.
ASJC Scopus subject areas
- Materials Chemistry
- Surfaces and Interfaces
- Electronic, Optical and Magnetic Materials
- Surfaces, Coatings and Films
- Metals and Alloys