@inproceedings{f67f5c7b2cfc4154b38d0be02af3de96,
title = "Dual-wavelength digital holographic microscopy with sub-nanometer axial accuray",
abstract = "We present dual-wavelength Digital Holographic Microscopy (DHM) measurements on a certified 8.9 nm high Chromium thin step sample and demonstrate sub-nanometer axial accuracy. We introduce a modified DHM Reference Calibrated Hologram (RCH) reconstruction algorithm taking into account amplitude contributions. By combining this with a temporal averaging procedure and a specific dual-wavelength DHM arrangement, it is shown that specimen topography can be measured with an accuracy, defined as the axial standard deviation, reduced to at least 0.9 nm. Indeed, it is reported that averaging each of the two wavefronts recorded with realtime dual-wavelength DHM can provide up to 30% spatial noise reduction for the given configuration, thanks to their non-correlated nature.",
keywords = "Digital holography, High-resolution, Interferometry, Optical metrology, Phase imaging",
author = "Jonas K{\"u}hn and Florian Charri{\`e}re and Tristan Colomb and Fr{\'e}d{\'e}ric Montfort and Etienne Cuche and Yves Emery and Pierre Marquet and Christian Depeursinge",
year = "2008",
doi = "10.1117/12.781263",
language = "English (US)",
isbn = "9780819471932",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
booktitle = "Optical Micro- and Nanometrology in Microsystems Technology II",
note = "Optical Micro- and Nanometrology in Microsystems Technology II ; Conference date: 08-04-2008 Through 10-04-2008",
}