Dual-wavelength digital holographic microscopy with sub-nanometer axial accuray

Jonas Kühn*, Florian Charrière, Tristan Colomb, Frédéric Montfort, Etienne Cuche, Yves Emery, Pierre Marquet, Christian Depeursinge

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review


We present dual-wavelength Digital Holographic Microscopy (DHM) measurements on a certified 8.9 nm high Chromium thin step sample and demonstrate sub-nanometer axial accuracy. We introduce a modified DHM Reference Calibrated Hologram (RCH) reconstruction algorithm taking into account amplitude contributions. By combining this with a temporal averaging procedure and a specific dual-wavelength DHM arrangement, it is shown that specimen topography can be measured with an accuracy, defined as the axial standard deviation, reduced to at least 0.9 nm. Indeed, it is reported that averaging each of the two wavefronts recorded with realtime dual-wavelength DHM can provide up to 30% spatial noise reduction for the given configuration, thanks to their non-correlated nature.

Original languageEnglish (US)
Title of host publicationOptical Micro- and Nanometrology in Microsystems Technology II
StatePublished - 2008
Externally publishedYes
EventOptical Micro- and Nanometrology in Microsystems Technology II - Strasbourg, France
Duration: Apr 8 2008Apr 10 2008

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
ISSN (Print)0277-786X


OtherOptical Micro- and Nanometrology in Microsystems Technology II


  • Digital holography
  • High-resolution
  • Interferometry
  • Optical metrology
  • Phase imaging

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Applied Mathematics
  • Electrical and Electronic Engineering
  • Computer Science Applications


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