Dry lithography of chemically-amplified acid-catalyzed deep-UV and E-beam resist

Yosef Y. Shacham-Diamand*, C. Lee, Jean M. Frechet, S. M. Lee

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

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Chemistry

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Biochemistry, Genetics and Molecular Biology

Material Science

Pharmacology, Toxicology and Pharmaceutical Science