DIET processes on ruthenium surfaces related to extreme ultraviolet lithography (EUVL)

B. V. Yakshinskiy; R. Wasielewski; E. Loginova; M. N. Hedhili; T. E. Madey

doi:10.1016/j.susc.2007.10.055

DIET processes on ruthenium surfaces related to extreme ultraviolet lithography (EUVL)

B. V. Yakshinskiy, R. Wasielewski, E. Loginova^*, M. N. Hedhili, T. E. Madey

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

18 Scopus citations

Abstract

The aim of this work is to provide insights into desorption induced by electronic transitions (DIET) processes that affect the reflectivity of ruthenium-capped Mo/Si multilayer mirrors working under EUVL (extreme ultraviolet lithography) operating conditions [high vacuum, and 13.5 nm (92 eV) photons]. Critical issues are associated with possible oxidation of the 2 nm thick Ru capping layer due to the inevitable background pressure of H₂O, and carbon build up due to background hydrocarbons. In the present work, we discuss aspects of the radiation-induced surface chemistry of Ru irradiated by 100 eV electrons and 92 eV photons. The cross section for electron-stimulated desorption of oxygen from O-covered Ru is ∼6 × 10^-19 cm². Carbon accumulation several nm thick occurs on the Ru surface during electron irradiation in methyl methacrylate (MMA) vapor, a model background impurity hydrocarbon. Radiation damage by low-energy secondary electrons is believed to dominate over direct photoexcitation of adsorbates under EUVL conditions. The secondary electron yield from Ru varies strongly with photon energy, and is ∼0.02 electrons/photon at 92 eV.

Original language	English (US)
Pages (from-to)	3220-3224
Number of pages	5
Journal	Surface Science
Volume	602
Issue number	20
DOIs	https://doi.org/10.1016/j.susc.2007.10.055
State	Published - Oct 15 2008
Externally published	Yes

Keywords

Electron-stimulated desorption
Electronic transitions

ASJC Scopus subject areas

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

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10.1016/j.susc.2007.10.055

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title = "DIET processes on ruthenium surfaces related to extreme ultraviolet lithography (EUVL)",

abstract = "The aim of this work is to provide insights into desorption induced by electronic transitions (DIET) processes that affect the reflectivity of ruthenium-capped Mo/Si multilayer mirrors working under EUVL (extreme ultraviolet lithography) operating conditions [high vacuum, and 13.5 nm (92 eV) photons]. Critical issues are associated with possible oxidation of the 2 nm thick Ru capping layer due to the inevitable background pressure of H2O, and carbon build up due to background hydrocarbons. In the present work, we discuss aspects of the radiation-induced surface chemistry of Ru irradiated by 100 eV electrons and 92 eV photons. The cross section for electron-stimulated desorption of oxygen from O-covered Ru is ∼6 × 10-19 cm2. Carbon accumulation several nm thick occurs on the Ru surface during electron irradiation in methyl methacrylate (MMA) vapor, a model background impurity hydrocarbon. Radiation damage by low-energy secondary electrons is believed to dominate over direct photoexcitation of adsorbates under EUVL conditions. The secondary electron yield from Ru varies strongly with photon energy, and is ∼0.02 electrons/photon at 92 eV.",

keywords = "Electron-stimulated desorption, Electronic transitions",

author = "Yakshinskiy, {B. V.} and R. Wasielewski and E. Loginova and Hedhili, {M. N.} and Madey, {T. E.}",

year = "2008",

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day = "15",

doi = "10.1016/j.susc.2007.10.055",

language = "English (US)",

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T1 - DIET processes on ruthenium surfaces related to extreme ultraviolet lithography (EUVL)

AU - Yakshinskiy, B. V.

AU - Wasielewski, R.

AU - Loginova, E.

AU - Hedhili, M. N.

AU - Madey, T. E.

PY - 2008/10/15

Y1 - 2008/10/15

N2 - The aim of this work is to provide insights into desorption induced by electronic transitions (DIET) processes that affect the reflectivity of ruthenium-capped Mo/Si multilayer mirrors working under EUVL (extreme ultraviolet lithography) operating conditions [high vacuum, and 13.5 nm (92 eV) photons]. Critical issues are associated with possible oxidation of the 2 nm thick Ru capping layer due to the inevitable background pressure of H2O, and carbon build up due to background hydrocarbons. In the present work, we discuss aspects of the radiation-induced surface chemistry of Ru irradiated by 100 eV electrons and 92 eV photons. The cross section for electron-stimulated desorption of oxygen from O-covered Ru is ∼6 × 10-19 cm2. Carbon accumulation several nm thick occurs on the Ru surface during electron irradiation in methyl methacrylate (MMA) vapor, a model background impurity hydrocarbon. Radiation damage by low-energy secondary electrons is believed to dominate over direct photoexcitation of adsorbates under EUVL conditions. The secondary electron yield from Ru varies strongly with photon energy, and is ∼0.02 electrons/photon at 92 eV.

AB - The aim of this work is to provide insights into desorption induced by electronic transitions (DIET) processes that affect the reflectivity of ruthenium-capped Mo/Si multilayer mirrors working under EUVL (extreme ultraviolet lithography) operating conditions [high vacuum, and 13.5 nm (92 eV) photons]. Critical issues are associated with possible oxidation of the 2 nm thick Ru capping layer due to the inevitable background pressure of H2O, and carbon build up due to background hydrocarbons. In the present work, we discuss aspects of the radiation-induced surface chemistry of Ru irradiated by 100 eV electrons and 92 eV photons. The cross section for electron-stimulated desorption of oxygen from O-covered Ru is ∼6 × 10-19 cm2. Carbon accumulation several nm thick occurs on the Ru surface during electron irradiation in methyl methacrylate (MMA) vapor, a model background impurity hydrocarbon. Radiation damage by low-energy secondary electrons is believed to dominate over direct photoexcitation of adsorbates under EUVL conditions. The secondary electron yield from Ru varies strongly with photon energy, and is ∼0.02 electrons/photon at 92 eV.

KW - Electron-stimulated desorption

KW - Electronic transitions

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DO - 10.1016/j.susc.2007.10.055

M3 - Article

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SN - 0039-6028

VL - 602

SP - 3220

EP - 3224

JO - Surface Science

JF - Surface Science

IS - 20

ER -

DIET processes on ruthenium surfaces related to extreme ultraviolet lithography (EUVL)

Abstract

Keywords

ASJC Scopus subject areas

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