Dewetting of resist/metal bilayers in resist stripping processes

Yihong Wu*, Peiwen Qiao, Towchong Chong, Teck Seng Low, Hong Xie, Ping Luo, Zaibing Guo, Jinjun Qiu

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

2 Scopus citations


We report the observations of dewetting of resist/metal bilayers in a resist stripping process of nanofabrication in O2 plasma. The initiation of the dewetting process is tentatively associated with local heating caused by surface plasmon induced in metallic nanoparticles or nanowires. The surface patterns thus formed differ substantially from all the dewetting patterns reported so far, and they resemble trees at micrometer scale. The possible mechanism for the formation of this kind striking patterns is discussed and its implication to future nanoelectronics manufacturing is addressed.

Original languageEnglish (US)
Pages (from-to)3361-3363
Number of pages3
JournalApplied Physics Letters
Issue number21
StatePublished - May 21 2001
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)


Dive into the research topics of 'Dewetting of resist/metal bilayers in resist stripping processes'. Together they form a unique fingerprint.

Cite this