Developing a systematic approach to metal gates and high-k dielectrics in future-generation CMOS

Prashant Majhi*, Huang Chun Wen, Husam Niman Alshareef, H. Rusty Harris, Hongfa Luan, Kisik Choi, C. S. Park, Seung Chul Song, Byoung Hun Lee, Raj Jammy

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

1 Scopus citations
Original languageEnglish (US)
Pages (from-to)25-31
Number of pages7
Issue number4
StatePublished - Dec 27 2006

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Materials Science(all)
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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