Designing a non-volatile imaging switch for mass-persistent, chemically amplified photolithography: A model study

John M. Klopp; Nicolas Bensel; Zachary M. Fresco; Jean Frechet

doi:10.1039/b209695a

Designing a non-volatile imaging switch for mass-persistent, chemically amplified photolithography: A model study

John M. Klopp, Nicolas Bensel, Zachary M. Fresco, Jean Frechet^*

^*Corresponding author for this work

Physical Sciences and Engineering

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

Abstract

An acid catalysed rearrangement that transforms a bicyclic lactone into a phenolic carboxylic acid has been tested for potential use in chemically amplified microlithographic imaging.

Original language	English (US)
Pages (from-to)	2956-2957
Number of pages	2
Journal	Chemical Communications
Volume	8
Issue number	24
DOIs	https://doi.org/10.1039/b209695a
State	Published - Dec 1 2002

ASJC Scopus subject areas

Catalysis
Electronic, Optical and Magnetic Materials
Ceramics and Composites
Chemistry(all)
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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title = "Designing a non-volatile imaging switch for mass-persistent, chemically amplified photolithography: A model study",

abstract = "An acid catalysed rearrangement that transforms a bicyclic lactone into a phenolic carboxylic acid has been tested for potential use in chemically amplified microlithographic imaging.",

author = "Klopp, {John M.} and Nicolas Bensel and Fresco, {Zachary M.} and Jean Frechet",

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AU - Frechet, Jean

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Designing a non-volatile imaging switch for mass-persistent, chemically amplified photolithography: A model study

Abstract

ASJC Scopus subject areas

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