Design, synthesis, and characterization of carbon-rich cyclopolymers for 193 nm microlithography

D. Pasini; J. M. Klopp; J. M.J. Fréchet

doi:10.1021/cm0104304

Design, synthesis, and characterization of carbon-rich cyclopolymers for 193 nm microlithography

D. Pasini, J. M. Klopp, J. M.J. Fréchet^*

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

46 Scopus citations

Abstract

A series of cyclopolymers designed for use in 193 nm photoresist materials has been synthesized and characterized. These novel materials that provide both optical transparency at 193 nm and also reactive ion etch resistance are obtained via cyclopolymerization of suitably designed bifunctional monomers incorporating acrylic and olefinic double bonds. The approach is highly versatile and allows the preparation of a broad array of structurally related materials with different substituents providing the imaging function and the desired level of etch resistance. The cyclopolymerization process is experimentally forgiving, enabling control of the molecular weight as well as the incorporation of comonomers such as acrylic acid or maleic anhydride to fine-tune the lithographic properties.

Original language	English (US)
Pages (from-to)	4136-4146
Number of pages	11
Journal	Chemistry of Materials
Volume	13
Issue number	11
DOIs	https://doi.org/10.1021/cm0104304
State	Published - 2001
Externally published	Yes

ASJC Scopus subject areas

General Chemistry
General Chemical Engineering
Materials Chemistry

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10.1021/cm0104304

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abstract = "A series of cyclopolymers designed for use in 193 nm photoresist materials has been synthesized and characterized. These novel materials that provide both optical transparency at 193 nm and also reactive ion etch resistance are obtained via cyclopolymerization of suitably designed bifunctional monomers incorporating acrylic and olefinic double bonds. The approach is highly versatile and allows the preparation of a broad array of structurally related materials with different substituents providing the imaging function and the desired level of etch resistance. The cyclopolymerization process is experimentally forgiving, enabling control of the molecular weight as well as the incorporation of comonomers such as acrylic acid or maleic anhydride to fine-tune the lithographic properties.",

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year = "2001",

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AU - Pasini, D.

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AU - Fréchet, J. M.J.

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Y1 - 2001

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AB - A series of cyclopolymers designed for use in 193 nm photoresist materials has been synthesized and characterized. These novel materials that provide both optical transparency at 193 nm and also reactive ion etch resistance are obtained via cyclopolymerization of suitably designed bifunctional monomers incorporating acrylic and olefinic double bonds. The approach is highly versatile and allows the preparation of a broad array of structurally related materials with different substituents providing the imaging function and the desired level of etch resistance. The cyclopolymerization process is experimentally forgiving, enabling control of the molecular weight as well as the incorporation of comonomers such as acrylic acid or maleic anhydride to fine-tune the lithographic properties.

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ER -

Design, synthesis, and characterization of carbon-rich cyclopolymers for 193 nm microlithography

Abstract

ASJC Scopus subject areas

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