Design of photoresists with reduced environmental impact. II. water-soluble resists based on photocrosslinking of poly(2-lsopropenyl-2-oxazoline)

J. M. Havard*, M. Yoshida, D. Pasini, N. Vladimirov, Jean Frechet, D. R. Medeiros, K. Patterson, S. Yamada, C. G. Willson, J. D. Byers

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

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