Deposition of sol-gel derived inorganic and composite material films on InP for integrated optics

J. Liu; Y. L. Lam; Y. C. Chan; Y. Zhou; W. X. Que; G. Tan; B. S. Ooi

doi:10.1117/12.370341

Deposition of sol-gel derived inorganic and composite material films on InP for integrated optics

J. Liu^*, Y. L. Lam, Y. C. Chan, Y. Zhou, W. X. Que, G. Tan, B. S. Ooi

^*Corresponding author for this work

Research output: Contribution to journal › Conference article › peer-review

Abstract

In this paper, we present the fabrication of sol-gel derived silica based films on InP using both inorganic and composite material precursors. Thin silica films with thicknesses less than 0.5μm are achieved using an inorganic precursor by means of multiple spin coatings and rapid thermal processing (RTP) at an annealing temperature of 450°C. The cracking pattern of the inorganic silica film on InP is analyzed. Thick films are derived from composite materials by multiple spin coatings with only furnace baking at 150°C. In addition, the different properties of each type of films and their potential applications in terms of monolithic integration are discussed.

Original language	English (US)
Pages (from-to)	417-424
Number of pages	8
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	3896
DOIs	https://doi.org/10.1117/12.370341
State	Published - 1999
Externally published	Yes
Event	Proceedings of the 1999 Design, Fabrication, and Characterization of Photonic Devices - Singapore, Singapore Duration: Nov 30 1999 → Dec 3 1999

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

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10.1117/12.370341

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@article{e3e40784f7ab4e7680fe39c7345767e5,

title = "Deposition of sol-gel derived inorganic and composite material films on InP for integrated optics",

abstract = "In this paper, we present the fabrication of sol-gel derived silica based films on InP using both inorganic and composite material precursors. Thin silica films with thicknesses less than 0.5μm are achieved using an inorganic precursor by means of multiple spin coatings and rapid thermal processing (RTP) at an annealing temperature of 450°C. The cracking pattern of the inorganic silica film on InP is analyzed. Thick films are derived from composite materials by multiple spin coatings with only furnace baking at 150°C. In addition, the different properties of each type of films and their potential applications in terms of monolithic integration are discussed.",

author = "J. Liu and Lam, {Y. L.} and Chan, {Y. C.} and Y. Zhou and Que, {W. X.} and G. Tan and Ooi, {B. S.}",

year = "1999",

doi = "10.1117/12.370341",

language = "English (US)",

volume = "3896",

pages = "417--424",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

publisher = "SPIE",

note = "Proceedings of the 1999 Design, Fabrication, and Characterization of Photonic Devices ; Conference date: 30-11-1999 Through 03-12-1999",

}

TY - JOUR

T1 - Deposition of sol-gel derived inorganic and composite material films on InP for integrated optics

AU - Liu, J.

AU - Lam, Y. L.

AU - Chan, Y. C.

AU - Zhou, Y.

AU - Que, W. X.

AU - Tan, G.

AU - Ooi, B. S.

PY - 1999

Y1 - 1999

N2 - In this paper, we present the fabrication of sol-gel derived silica based films on InP using both inorganic and composite material precursors. Thin silica films with thicknesses less than 0.5μm are achieved using an inorganic precursor by means of multiple spin coatings and rapid thermal processing (RTP) at an annealing temperature of 450°C. The cracking pattern of the inorganic silica film on InP is analyzed. Thick films are derived from composite materials by multiple spin coatings with only furnace baking at 150°C. In addition, the different properties of each type of films and their potential applications in terms of monolithic integration are discussed.

AB - In this paper, we present the fabrication of sol-gel derived silica based films on InP using both inorganic and composite material precursors. Thin silica films with thicknesses less than 0.5μm are achieved using an inorganic precursor by means of multiple spin coatings and rapid thermal processing (RTP) at an annealing temperature of 450°C. The cracking pattern of the inorganic silica film on InP is analyzed. Thick films are derived from composite materials by multiple spin coatings with only furnace baking at 150°C. In addition, the different properties of each type of films and their potential applications in terms of monolithic integration are discussed.

UR - http://www.scopus.com/inward/record.url?scp=0033310209&partnerID=8YFLogxK

U2 - 10.1117/12.370341

DO - 10.1117/12.370341

M3 - Conference article

AN - SCOPUS:0033310209

SN - 0277-786X

VL - 3896

SP - 417

EP - 424

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

T2 - Proceedings of the 1999 Design, Fabrication, and Characterization of Photonic Devices

Y2 - 30 November 1999 through 3 December 1999

ER -

Deposition of sol-gel derived inorganic and composite material films on InP for integrated optics

Abstract

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