TY - GEN
T1 - Dependency of the band gap of electrodeposited Copper oxide thin films on the concentration of copper sulfate (CuSO4.5H2O) and pH in bath solution for photovoltaic applications
AU - Islam, Md. Anisul
AU - Nurani, Sheikh Jaber
AU - Karim, Md. Adnan
AU - Rahman, Abu Sadat Md. Sayem
AU - Abdul Halim, Md. Md. Ansar Ali
N1 - KAUST Repository Item: Exported on 2020-10-01
PY - 2016/3/10
Y1 - 2016/3/10
N2 - In this study, Copper oxide thin films were deposited on copper plate by electrodeposition process in an electrolytic bath containing CuSO4.5H2O, 3M lactic acid and NaOH. Copper oxide films were electrodeposited at different pH and different concentration of CuSO4.5H2O and the optical band gap was determined from their absorption spectrum which was obtained from UV-Vis absorption spectroscopy. It was found that copper oxide films which were deposited at low concentration of CuSO4.5H2O have higher band gap than those deposited at higher bath concentration. The band gap of copper oxide films also significantly changes with pH of the bath solution. It was also observed that with the increase of the pH of bath solution band gap of copper oxide film decreased. © 2015 IEEE.
AB - In this study, Copper oxide thin films were deposited on copper plate by electrodeposition process in an electrolytic bath containing CuSO4.5H2O, 3M lactic acid and NaOH. Copper oxide films were electrodeposited at different pH and different concentration of CuSO4.5H2O and the optical band gap was determined from their absorption spectrum which was obtained from UV-Vis absorption spectroscopy. It was found that copper oxide films which were deposited at low concentration of CuSO4.5H2O have higher band gap than those deposited at higher bath concentration. The band gap of copper oxide films also significantly changes with pH of the bath solution. It was also observed that with the increase of the pH of bath solution band gap of copper oxide film decreased. © 2015 IEEE.
UR - http://hdl.handle.net/10754/621354
UR - http://ieeexplore.ieee.org/document/7428263
UR - http://www.scopus.com/inward/record.url?scp=84966666553&partnerID=8YFLogxK
U2 - 10.1109/CEEE.2015.7428263
DO - 10.1109/CEEE.2015.7428263
M3 - Conference contribution
SN - 9781509019397
SP - 229
EP - 232
BT - 2015 International Conference on Electrical & Electronic Engineering (ICEEE)
PB - Institute of Electrical and Electronics Engineers (IEEE)
ER -