Dendrimer-based self-assembled monolayers as resists for scanning probe lithography

Keyphrases

• Self-assembled Monolayer 100%
• Dendrimer 100%
• Scanning Probe Lithography 100%
• Oxides 50%
• Silicon Surface 50%
• Enhanced Oxidation 50%
• Silicon Wafer Surface 50%
• Covalent Attachment 50%
• Dendronized Polymers 50%
• Positive Tone 50%
• HF Etching 50%
• Relief Feature 50%

Material Science

• Self Assembled Monolayer 100%
• Scanning Probe Lithography 100%
• Dendrimer 100%
• Monolayers 66%
• Silicon Wafer 33%
• Oxidation Reaction 33%
• Oxide Compound 33%