Abstract
In the original version of the article, the wrong supplementary file4 was published; it has now been replaced with the correct file. The original article has been corrected.
Original language | English (US) |
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Pages (from-to) | 1473 |
Number of pages | 1 |
Journal | Plasma Chemistry and Plasma Processing |
Volume | 43 |
Issue number | 6 |
DOIs |
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State | Published - Nov 2023 |
Bibliographical note
Publisher Copyright:© 2023, Springer Science+Business Media, LLC, part of Springer Nature.
ASJC Scopus subject areas
- General Chemistry
- General Chemical Engineering
- Condensed Matter Physics
- Surfaces, Coatings and Films