Abstract
We succeeded in growing almost completely relaxed, high-quality, thick GaInN films on an m-plane GaN template with grooves along the 〈0 0 0 1〉 direction, using lateral-growth technology. Reciprocal space mapping of asymmetrical X-ray diffraction confirmed almost complete relaxation. By transmission electroscopic characterization, the growth of GaInN film with a threading dislocation density of approximately 1×108 cm-2 was confirmed. © 2008 Elsevier B.V. All rights reserved.
Original language | English (US) |
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Pages (from-to) | 4920-4922 |
Number of pages | 3 |
Journal | Journal of Crystal Growth |
Volume | 310 |
Issue number | 23 |
DOIs | |
State | Published - Nov 15 2008 |
Externally published | Yes |
Bibliographical note
Generated from Scopus record by KAUST IRTS on 2023-09-21ASJC Scopus subject areas
- Materials Chemistry
- Inorganic Chemistry
- Condensed Matter Physics