Comprehensive Power Gain Assessment of GaN-SOI-FinFET for Improved RF/Wireless Performance Using TCAD

Ajay Kumar, Neha Gupta, Amit Kumar Goyal, Yehia Mahmoud Massoud

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Abstract

In this work, we present a radio frequency (RF) assessment of the nanoscale gallium nitride-silicon-on-insulator fin field-effect transistor (GaN-SOI-FinFET). All the performances of the device were compared with GaN-FinFET and conventional FinFET (Conv. FinFET) simultaneously. All the results show that the power gains significantly improved in terms of Gma, Gms, Stern stability factor (SS), GMT, and intrinsic delay in comparison with conventional FinFET. Current gain and unilateral power gain were also evaluated for the extraction of fT (cut-off frequency) and fMAX, respectively. fT and fMAX were enhanced by 88.8% and 94.6%, respectively. This analysis was performed at several THz frequencies. Further, the parametric assessment was also performed in terms of gate length and oxide thickness to find the optimized value of gate length and oxide thickness. The implementation of GaN in the channel reduces the parasitic capacitance and paves the way for high-performance RF applications.
Original languageEnglish (US)
Pages (from-to)1418
JournalMicromachines
Volume13
Issue number9
DOIs
StatePublished - Aug 28 2022

Bibliographical note

KAUST Repository Item: Exported on 2022-12-26
Acknowledgements: The authors would like to acknowledge the research funding to the Innovative Technologies Laboratories (ITL) from King Abdullah University of Science and Technology (KAUST).

ASJC Scopus subject areas

  • Control and Systems Engineering
  • Electrical and Electronic Engineering
  • Mechanical Engineering

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