Combined optical, surface and nuclear microscopic assessment of porous silicon formed in HF-acetonitrile

Z. C. Feng; J. W. Yu; K. Li; Y. P. Feng; K. R. Padmanabhan; T. R. Yang

doi:10.1016/j.surfcoat.2005.07.025

Combined optical, surface and nuclear microscopic assessment of porous silicon formed in HF-acetonitrile

Z. C. Feng^*, J. W. Yu, K. Li, Y. P. Feng, K. R. Padmanabhan, T. R. Yang

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

8 Scopus citations

Abstract

A new type of HF solution, HF-acetonitrile (MeCN), has been employed to produce 10-30 μm thick porous silicon (P-Si) layers by photoelectrochemical etching of different types of Si wafers, Si(100), Si(111) and polycrystalline Si, with different resistivities. A combined optical, surface and nuclear microscopic assessment of these P-Si layers was performed using photoluminescence (PL), Raman scattering, X-ray photoelectron spectroscopy and Rutherford backscattering spectroscopy. With increasing resistivity of the Si(100) wafers, the P-Si layers show a slight blue shift of their visible light emission peak energy, an up shift of the peak position and a narrowing of the band width of the dominant Raman band, and a decrease in the amount of residual elemental Si on the surface. Those Si(111) wafers, etched in HF-MeCN, showed no porous structures and no visible light emission.

Original language	English (US)
Pages (from-to)	3254-3260
Number of pages	7
Journal	Surface and Coatings Technology
Volume	200
Issue number	10 SPEC. ISS.
DOIs	https://doi.org/10.1016/j.surfcoat.2005.07.025
State	Published - Feb 24 2006
Externally published	Yes

Bibliographical note

Funding Information:
We acknowledge the help and support from Drs. Z. Chen, A. Rohatgi, A. T. S. Wee, J. Lin, K. T. Yu and S. Perkowitz. The work at National Taiwan University was supported by funds from National Science Council of Republic of China, NSC 93-2218-E-002-011 and 93-2215-E-002-035.

Keywords

PL
Porous silicon
RBS
Raman
Raman scattering
SEM
XPS

ASJC Scopus subject areas

General Chemistry
Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

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10.1016/j.surfcoat.2005.07.025

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title = "Combined optical, surface and nuclear microscopic assessment of porous silicon formed in HF-acetonitrile",

abstract = "A new type of HF solution, HF-acetonitrile (MeCN), has been employed to produce 10-30 μm thick porous silicon (P-Si) layers by photoelectrochemical etching of different types of Si wafers, Si(100), Si(111) and polycrystalline Si, with different resistivities. A combined optical, surface and nuclear microscopic assessment of these P-Si layers was performed using photoluminescence (PL), Raman scattering, X-ray photoelectron spectroscopy and Rutherford backscattering spectroscopy. With increasing resistivity of the Si(100) wafers, the P-Si layers show a slight blue shift of their visible light emission peak energy, an up shift of the peak position and a narrowing of the band width of the dominant Raman band, and a decrease in the amount of residual elemental Si on the surface. Those Si(111) wafers, etched in HF-MeCN, showed no porous structures and no visible light emission.",

keywords = "PL, Porous silicon, RBS, Raman, Raman scattering, SEM, XPS",

author = "Feng, {Z. C.} and Yu, {J. W.} and K. Li and Feng, {Y. P.} and Padmanabhan, {K. R.} and Yang, {T. R.}",

note = "Funding Information: We acknowledge the help and support from Drs. Z. Chen, A. Rohatgi, A. T. S. Wee, J. Lin, K. T. Yu and S. Perkowitz. The work at National Taiwan University was supported by funds from National Science Council of Republic of China, NSC 93-2218-E-002-011 and 93-2215-E-002-035. ",

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doi = "10.1016/j.surfcoat.2005.07.025",

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AU - Yu, J. W.

AU - Li, K.

AU - Feng, Y. P.

AU - Padmanabhan, K. R.

AU - Yang, T. R.

N1 - Funding Information: We acknowledge the help and support from Drs. Z. Chen, A. Rohatgi, A. T. S. Wee, J. Lin, K. T. Yu and S. Perkowitz. The work at National Taiwan University was supported by funds from National Science Council of Republic of China, NSC 93-2218-E-002-011 and 93-2215-E-002-035.

PY - 2006/2/24

Y1 - 2006/2/24

N2 - A new type of HF solution, HF-acetonitrile (MeCN), has been employed to produce 10-30 μm thick porous silicon (P-Si) layers by photoelectrochemical etching of different types of Si wafers, Si(100), Si(111) and polycrystalline Si, with different resistivities. A combined optical, surface and nuclear microscopic assessment of these P-Si layers was performed using photoluminescence (PL), Raman scattering, X-ray photoelectron spectroscopy and Rutherford backscattering spectroscopy. With increasing resistivity of the Si(100) wafers, the P-Si layers show a slight blue shift of their visible light emission peak energy, an up shift of the peak position and a narrowing of the band width of the dominant Raman band, and a decrease in the amount of residual elemental Si on the surface. Those Si(111) wafers, etched in HF-MeCN, showed no porous structures and no visible light emission.

AB - A new type of HF solution, HF-acetonitrile (MeCN), has been employed to produce 10-30 μm thick porous silicon (P-Si) layers by photoelectrochemical etching of different types of Si wafers, Si(100), Si(111) and polycrystalline Si, with different resistivities. A combined optical, surface and nuclear microscopic assessment of these P-Si layers was performed using photoluminescence (PL), Raman scattering, X-ray photoelectron spectroscopy and Rutherford backscattering spectroscopy. With increasing resistivity of the Si(100) wafers, the P-Si layers show a slight blue shift of their visible light emission peak energy, an up shift of the peak position and a narrowing of the band width of the dominant Raman band, and a decrease in the amount of residual elemental Si on the surface. Those Si(111) wafers, etched in HF-MeCN, showed no porous structures and no visible light emission.

KW - PL

KW - Porous silicon

KW - RBS

KW - Raman

KW - Raman scattering

KW - SEM

KW - XPS

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IS - 10 SPEC. ISS.

ER -

Combined optical, surface and nuclear microscopic assessment of porous silicon formed in HF-acetonitrile

Abstract

Bibliographical note

Keywords

ASJC Scopus subject areas

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