Chemically amplified resists based on polymer side-chain rearrangement or electrophilic crosslinking

J. M.J. Frechet; S. Matuszczak; S. M. Lee; J. Fahey; C. G. Willson

Chemically amplified resists based on polymer side-chain rearrangement or electrophilic crosslinking

J. M.J. Frechet^*, S. Matuszczak, S. M. Lee, J. Fahey, C. G. Willson

^*Corresponding author for this work

Research output: Contribution to conference › Paper › peer-review

Abstract

The authors have explored a large number of alternate designs for imaging systems based on acid catalyzed electrophilic aromatic processes. These include the use of new latent crosslinkers as well as new activated aromatic moieties, the development of an image reversal process forpositive tone imaging with dry development, the design of an image reversal scheme involving the in-situ photogeneration of base, and the achievement of dual-tone (positive and negative) imaging through electrophilic aromatic rearrangements. This paper describes these approaches which illustrate the versatility of the overall design.

Original language	English (US)
Pages	31-40
Number of pages	10
State	Published - 1991
Externally published	Yes
Event	9th International Technical Conference on Photopolymers - Ellenville, NY, USA Duration: Oct 28 1991 → Oct 30 1991

Other

Other	9th International Technical Conference on Photopolymers
City	Ellenville, NY, USA
Period	10/28/91 → 10/30/91

ASJC Scopus subject areas

General Engineering

Cite this

@conference{3eea491d87a04e11ba6e3d27738bf39d,

title = "Chemically amplified resists based on polymer side-chain rearrangement or electrophilic crosslinking",

abstract = "The authors have explored a large number of alternate designs for imaging systems based on acid catalyzed electrophilic aromatic processes. These include the use of new latent crosslinkers as well as new activated aromatic moieties, the development of an image reversal process forpositive tone imaging with dry development, the design of an image reversal scheme involving the in-situ photogeneration of base, and the achievement of dual-tone (positive and negative) imaging through electrophilic aromatic rearrangements. This paper describes these approaches which illustrate the versatility of the overall design.",

author = "Frechet, {J. M.J.} and S. Matuszczak and Lee, {S. M.} and J. Fahey and Willson, {C. G.}",

year = "1991",

language = "English (US)",

pages = "31--40",

note = "9th International Technical Conference on Photopolymers ; Conference date: 28-10-1991 Through 30-10-1991",

}

TY - CONF

T1 - Chemically amplified resists based on polymer side-chain rearrangement or electrophilic crosslinking

AU - Frechet, J. M.J.

AU - Matuszczak, S.

AU - Lee, S. M.

AU - Fahey, J.

AU - Willson, C. G.

PY - 1991

Y1 - 1991

N2 - The authors have explored a large number of alternate designs for imaging systems based on acid catalyzed electrophilic aromatic processes. These include the use of new latent crosslinkers as well as new activated aromatic moieties, the development of an image reversal process forpositive tone imaging with dry development, the design of an image reversal scheme involving the in-situ photogeneration of base, and the achievement of dual-tone (positive and negative) imaging through electrophilic aromatic rearrangements. This paper describes these approaches which illustrate the versatility of the overall design.

AB - The authors have explored a large number of alternate designs for imaging systems based on acid catalyzed electrophilic aromatic processes. These include the use of new latent crosslinkers as well as new activated aromatic moieties, the development of an image reversal process forpositive tone imaging with dry development, the design of an image reversal scheme involving the in-situ photogeneration of base, and the achievement of dual-tone (positive and negative) imaging through electrophilic aromatic rearrangements. This paper describes these approaches which illustrate the versatility of the overall design.

UR - http://www.scopus.com/inward/record.url?scp=0026406508&partnerID=8YFLogxK

M3 - Paper

AN - SCOPUS:0026406508

SP - 31

EP - 40

T2 - 9th International Technical Conference on Photopolymers

Y2 - 28 October 1991 through 30 October 1991

ER -

Chemically amplified resists based on polymer side-chain rearrangement or electrophilic crosslinking

Abstract

Other

ASJC Scopus subject areas

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