J. M J Frechet*, F. M. Houlihan, F. Bouchard, E. Eichler, A. Hult, R. Allen, S. MacDonald, H. Ito, C. G. Willson

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review


Approaches to the design of resist materials which incorporate chemical amplification have been directed toward three different areas: Synthesis of polymers which undergo radiation-induced modification of side-chain polarity in a catalytic process. Synthesis of thermally depolymerizable polycarbonates designed to provide imaging via an acid catalyzed multiple chain-scission process. This design concept is extended to a variety of tertiary, allylic, and benzylic polycarbonates. These share the same ability to undergo facile acid-catalyzed thermolysis, with formation of volatile low molecular weight fragments. Chemical amplification is seen as a promising approach in the search for new systems which can be used in deep-UV imaging. The systems described show that the resist chemist can make a voluable contribution to microlithography through appropriate molecular design and the application of simple chemical concepts.

Original languageEnglish (US)
Title of host publicationTechnical Papers, Regional Technical Conference - Society of Plastics Engineers
PublisherSoc of Plastics Engineers Inc
Number of pages10
StatePublished - 1985
Externally publishedYes

ASJC Scopus subject areas

  • Engineering(all)


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