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Characterization of ultrathin gate dielectrics formed by in-situ steam generation with nitrogen postprocessing
A. Karamcheti, V. H.C. Watt, H. N. Al-Shareef, T. Y. Luo, M. D. Jackson, H. R. Huff, C. Steinbrüchel
Research output: Contribution to journal › Article › peer-review
1
Scopus
citations