Characterization of organic thin films using transmission electron microscopy and Fourier Transform Infra Red spectroscopy

Unnat S. Bhansali, M. A. Quevedo Lopez, Huiping Jia, H. N. Alshareef, Dong Kyu Cha, M. J. Kim, Bruce E. Gnade*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

6 Scopus citations


Organic Light Emitting Diodes (OLEDs) have received much attention for use in display and solid-state lighting applications. Consequently, evaluating materials analyses techniques to better understand potential issues between the different films constituting the OLED device structure becomes important. In particular, film thickness monitoring and control is essential for reproducible and reliable OLED performance. Typically, Quartz Crystal Microbalances (QCMs) are used to monitor the thicknesses in-situ. While QCMs can provide thickness information, they do not provide information about the composition or quality of the deposited films. To overcome these issues, in this paper, we have used Fourier Transform InfraRed Spectroscopy (FT-IR) to measure film thicknesses and compositions in individual as well as stacked organic layers relevant to OLED structures and used cross-sectional Transmission Electron Microscopy imaging to correlate the physical thickness of the organic films to their IR (infrared) absorption peak intensities from FT-IR. We demonstrate that this technique can be used to precisely measure film thicknesses within 5% of the nominal thickness and provide information about film composition.

Original languageEnglish (US)
Pages (from-to)5825-5829
Number of pages5
JournalThin Solid Films
Issue number20
StatePublished - Aug 31 2009


  • Characterization
  • Fourier Transform InfraRed Spectroscopy (FTIR)
  • Organic films
  • Transmission Electron Microscopy (TEM)

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Metals and Alloys
  • Materials Chemistry
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces


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