Abstract
Nanocrystalline diamond films, prepared by a microwave plasma-enhanced CVD, were implanted using 110-keV nitrogen ions under fluence ranging from 1016-1017 ions cm-2. AFM, XRD, XPS and Raman spectroscopy were used to analyze the changes in surface structure and chemical state of the films before and after implantation. Results show that high-fluence nitrogen ions implanted in the nanocrystalline diamond film cause a decline in diamond crystallinity and a swelling of the crystal lattice; the cubic-shaped diamond grains in the film transform into similar roundish-shaped grains due to the sputtering effect of implanted nitrogen ions. Nitrogen-ion implantation changes the surface chemical state of the nanocrystalline diamond film. After high-fluence implantation, the surface of the film is completely covered by a layer of oxygen-containing groups. This phenomenon plays an importance role in the reduction of the adhesive friction between an Al2O3 ball and the nanocrystalline diamond film.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 1441-1447 |
| Number of pages | 7 |
| Journal | Diamond and Related Materials |
| Volume | 10 |
| Issue number | 8 |
| DOIs | |
| State | Published - Jan 1 2001 |
Keywords
- Chemical vapor deposition(CVD)
- Friction
- Ion implantation
- Nanocrystalline diamond films
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Chemistry(all)
- Mechanical Engineering
- Materials Chemistry
- Electrical and Electronic Engineering