Abstract
The fabrication of porous Si-based Er-doped light-emitting devices is a very promising developing field for all-silicon light emitters. However, while luminescence of Er-doped porous silicon devices has been demonstrated, very little attention has been devoted to the doping process itself. We have undertaken a detailed study of this process, examining the porous silicon matrix from several points of view during and after the doping. In particular, we have found that the Er-doping process shows a threshold level which, as evidenced by the cross correlation of the various techniques used, does depend on the sample thickness and on the doping parameters.
Original language | English (US) |
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Article number | 376 |
Journal | Nanoscale Research Letters |
Volume | 7 |
DOIs | |
State | Published - 2012 |
Externally published | Yes |
Bibliographical note
Funding Information:This work was financially supported by the 851/DSPAR/2003 project funded by the Italian Ministry of University and Research. Dr. Michele Saba of the University of Cagliari is gratefully acknowledged for the useful discussions.
Keywords
- Er doping
- Light-emitting devices
- Porous silicon
- Refractive index
ASJC Scopus subject areas
- General Materials Science
- Condensed Matter Physics