TY - JOUR
T1 - Bi2O2Se: A rising star for semiconductor devices
AU - Ding, Xiang
AU - Li, Menglu
AU - Chen, Pei
AU - Zhao, Yan
AU - Zhao, Mei
AU - Leng, Huaqian
AU - Wang, Yong
AU - Ali, Sharafat
AU - Raziq, Fazal
AU - Wu, Xiaoqiang
AU - Xiao, Haiyan
AU - Zu, Xiaotao
AU - Wang, Qingyuan
AU - Vinu, Ajayan
AU - Yi, Jiabao
AU - Qiao, Liang
N1 - Generated from Scopus record by KAUST IRTS on 2023-09-21
PY - 2022/12/7
Y1 - 2022/12/7
N2 - With weak interlayer interactions and unique physical properties, bismuth oxyselenide (Bi2O2Se) has become a rising star as a novel quasi-2D material, possessing high symmetry, adjustable electronic structure, ultra-high electron mobility, persistent quantum oscillations, unique defects, strong spin-orbital coupling, natural oxide layers, excellent stability, and marvelous optoelectronic performance. These characteristics will help to break through existing technical barriers for applications such as field-effect transistors and photodetectors. Its unique crystal structure and suitable lattice parameters allow it to grow on lattice-matched (SrTiO3 and LaAlO3) and unmatched (mica and SiO2) substrates, establishing a link between traditional epitaxy and emerging van der Waals epitaxy. This review aims to provide an overview of this promising semiconductor from a fundamental structure, physics, and physical properties perspective. We especially pay attention to the correlation of electronic structure to various physical properties and material performance. We also identify current problems and challenges regarding the fundamental properties of this material.
AB - With weak interlayer interactions and unique physical properties, bismuth oxyselenide (Bi2O2Se) has become a rising star as a novel quasi-2D material, possessing high symmetry, adjustable electronic structure, ultra-high electron mobility, persistent quantum oscillations, unique defects, strong spin-orbital coupling, natural oxide layers, excellent stability, and marvelous optoelectronic performance. These characteristics will help to break through existing technical barriers for applications such as field-effect transistors and photodetectors. Its unique crystal structure and suitable lattice parameters allow it to grow on lattice-matched (SrTiO3 and LaAlO3) and unmatched (mica and SiO2) substrates, establishing a link between traditional epitaxy and emerging van der Waals epitaxy. This review aims to provide an overview of this promising semiconductor from a fundamental structure, physics, and physical properties perspective. We especially pay attention to the correlation of electronic structure to various physical properties and material performance. We also identify current problems and challenges regarding the fundamental properties of this material.
UR - https://linkinghub.elsevier.com/retrieve/pii/S2590238522006361
UR - http://www.scopus.com/inward/record.url?scp=85143985762&partnerID=8YFLogxK
U2 - 10.1016/j.matt.2022.11.005
DO - 10.1016/j.matt.2022.11.005
M3 - Article
SN - 2590-2385
VL - 5
SP - 4274
EP - 4314
JO - Matter
JF - Matter
IS - 12
ER -