Band alignment of orthorhombic Ga2O3 with GaN and AlN semiconductors

Shibin Krishna*, Yi Lu, Che Hao Liao, Vishal Khandelwal, Xiaohang Li

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

12 Scopus citations

Abstract

Ga2O3 semiconductors have attracted tremendous research interests because of their fascinating material properties for future-generation energy, electronic, and optoelectronic applications. In the present study, we have performed the epitaxial growth of tin-doped Ga2O3 on sapphire, GaN, and AlN templates by the pulsed laser deposition technique. The initial characterizations show a two-dimensional mode of single-crystalline orthorhombic Ga2O3 (κ-Ga2O3) growth on these substrates with smooth surface morphology. Integrating κ-Ga2O3 with nitride semiconductors is interesting since both these materials possess polarization, which could induce 2-dimensional carrier gas (2DCG) at the interface. X-ray photoelectron spectroscopy studies reveal that both κ-Ga2O3/GaN and κ-Ga2O3/AlN heterostructure form a type-I band structure where the conduction band offset (CBO) was calculated to be 1.38 eV and 1.04 eV, respectively. This unique band alignment with high CBO could lead to the development of efficient power devices.

Original languageEnglish (US)
Article number153901
JournalApplied Surface Science
Volume599
DOIs
StatePublished - Oct 15 2022

Bibliographical note

Publisher Copyright:
© 2022

Keywords

  • AlN
  • Band alignment
  • GaN
  • Orthorhombic GaO

ASJC Scopus subject areas

  • General Chemistry
  • Condensed Matter Physics
  • General Physics and Astronomy
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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