Atomic-resolution transmission electron microscopy of electron beam–sensitive crystalline materials

Daliang Zhang*, Yihan Zhu, Lingmei Liu, Xiangrong Ying, Chia En Hsiung, Rachid Sougrat, Kun Li, Yu Han

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

367 Scopus citations


High-resolution imaging of electron beam–sensitive materials is one of the most difficult applications of transmission electron microscopy (TEM). The challenges are manifold, including the acquisition of images with extremely low beam doses, the time-constrained search for crystal zone axes, the precise image alignment, and the accurate determination of the defocus value. We develop a suite of methods to fulfill these requirements and acquire atomic-resolution TEM images of several metal organic frameworks that are generally recognized as highly sensitive to electron beams. The high image resolution allows us to identify individual metal atomic columns, various types of surface termination, and benzene rings in the organic linkers. We also apply our methods to other electron beam–sensitive materials, including the organic-inorganic hybrid perovskite CH3NH3PbBr3.

Original languageEnglish (US)
Pages (from-to)675-679
Number of pages5
Issue number6376
StatePublished - Feb 9 2018

Bibliographical note

Publisher Copyright:
© 2017 The Authors.

ASJC Scopus subject areas

  • General


Dive into the research topics of 'Atomic-resolution transmission electron microscopy of electron beam–sensitive crystalline materials'. Together they form a unique fingerprint.

Cite this