Atomic-layer lithography of sub-10-nm plasmonic nanogaps on flat metallic surface

Dengxin Ji, Borui Chen, Xie Zeng, Tania Moein, Haomin Song, Nan Zhang, Qiaoqiang Gan, Alexander Cartwright

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We developed a novel atomic layer lithography procedure to fabricate large area flat metallic surfaces with sub-10-nm features, which is particularly useful for fabrication of nanostructures with strongly localized field enhancement.
Original languageEnglish (US)
Title of host publicationProceedings of Frontiers in Optics 2015, FIO 2015
PublisherOSA - The Optical Societycustserv@osa.org
ISBN (Print)9781943580033
DOIs
StatePublished - Jan 1 2015
Externally publishedYes

Cite this