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Alternative approaches for high-k/metal gate CMOS: Low temperature process (gate last) and SiGe channel
C. S. Park, M. M. Hussain, K. Tateiw, J. Huang, J. Lin, T. Ngai, S. Lian, Kelly Rader, B. Taylor, P. D. Kirsch, R. Jammy
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review
8
Scopus
citations