Abstract
Embodiments of the present disclosure describe an apparatus for thin film coating comprising a coating device configured to deposit a solution on a substrate; and a dryer component configured to spin gas proximate to the deposited solution to dry the deposited solution and form a thin film coating. Embodiments of the present disclosure further describe a method of forming a thin-film coating comprising depositing a solution on a substrate and spinning a gas proximate to the deposited solution to dry the deposited solution and form a thin film coating.
| Original language | English (US) |
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| Patent number | WO2018092067A1 |
| State | Published - May 24 2018 |