A Positive Tone Plasma-Developable Resist Obtained by Gas-Phase Image Reversal

Scott A. MacDonald; Nicholas J. Clecak; Grant C. Willson; Hubert Schlosser; Jean Frechet

doi:10.1021/cm00024a043

A Positive Tone Plasma-Developable Resist Obtained by Gas-Phase Image Reversal

Scott A. MacDonald^*, Nicholas J. Clecak, Grant C. Willson, Hubert Schlosser, Jean Frechet

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

9 Scopus citations

Abstract

This paper describes a gas-phase image reversal process that generates a positive tone, plasma-developable image from a chemically amplified photoresist system. This system is based on the catalytic photogeneration of phenolic hydroxyl groups within the resist film that react, in subsequent steps, with either a silylating agent or an isocyanate that is delivered in the gas phase. This forms silyl ethers and carbamates within the polymeric film. The regions of the film containing the organosilicon species are not etched in an oxygen plasma environment. Correspondingly, the carbamate regions of the film are rapidly etched in an oxygen plasma. The overall process results in a positive tone image after development in an oxygen plasma.

Original language	English (US)
Pages (from-to)	1364-1368
Number of pages	5
Journal	Chemistry of Materials
Volume	4
Issue number	6
DOIs	https://doi.org/10.1021/cm00024a043
State	Published - Feb 1 1992
Externally published	Yes

ASJC Scopus subject areas

General Chemistry
General Chemical Engineering
Materials Chemistry

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title = "A Positive Tone Plasma-Developable Resist Obtained by Gas-Phase Image Reversal",

abstract = "This paper describes a gas-phase image reversal process that generates a positive tone, plasma-developable image from a chemically amplified photoresist system. This system is based on the catalytic photogeneration of phenolic hydroxyl groups within the resist film that react, in subsequent steps, with either a silylating agent or an isocyanate that is delivered in the gas phase. This forms silyl ethers and carbamates within the polymeric film. The regions of the film containing the organosilicon species are not etched in an oxygen plasma environment. Correspondingly, the carbamate regions of the film are rapidly etched in an oxygen plasma. The overall process results in a positive tone image after development in an oxygen plasma.",

author = "MacDonald, {Scott A.} and Clecak, {Nicholas J.} and Willson, {Grant C.} and Hubert Schlosser and Jean Frechet",

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AU - MacDonald, Scott A.

AU - Clecak, Nicholas J.

AU - Willson, Grant C.

AU - Schlosser, Hubert

AU - Frechet, Jean

PY - 1992/2/1

Y1 - 1992/2/1

N2 - This paper describes a gas-phase image reversal process that generates a positive tone, plasma-developable image from a chemically amplified photoresist system. This system is based on the catalytic photogeneration of phenolic hydroxyl groups within the resist film that react, in subsequent steps, with either a silylating agent or an isocyanate that is delivered in the gas phase. This forms silyl ethers and carbamates within the polymeric film. The regions of the film containing the organosilicon species are not etched in an oxygen plasma environment. Correspondingly, the carbamate regions of the film are rapidly etched in an oxygen plasma. The overall process results in a positive tone image after development in an oxygen plasma.

AB - This paper describes a gas-phase image reversal process that generates a positive tone, plasma-developable image from a chemically amplified photoresist system. This system is based on the catalytic photogeneration of phenolic hydroxyl groups within the resist film that react, in subsequent steps, with either a silylating agent or an isocyanate that is delivered in the gas phase. This forms silyl ethers and carbamates within the polymeric film. The regions of the film containing the organosilicon species are not etched in an oxygen plasma environment. Correspondingly, the carbamate regions of the film are rapidly etched in an oxygen plasma. The overall process results in a positive tone image after development in an oxygen plasma.

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A Positive Tone Plasma-Developable Resist Obtained by Gas-Phase Image Reversal

Abstract

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