Abstract
We have realized for the first time deep-red emission from InGaN-based light-emitting diodes on c-plane sapphire substrates grown by metalorganic vapor-phase epitaxy. The peak wavelength was 740 nm by continuous current injection, in spite of a wide full-width at half-maximum. Indium incorporation was enhanced by a smaller distance of the opposing wall of the reactor from the susceptor, which resulted in raising the gas temperature. In addition, a higher number of quantum wells led to the relaxation of InGaN well layers and thus enhanced indium incorporation.
Original language | English (US) |
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Pages (from-to) | 13-16 |
Number of pages | 4 |
Journal | Journal of Crystal Growth |
Volume | 343 |
Issue number | 1 |
DOIs | |
State | Published - Mar 15 2012 |
Externally published | Yes |
Keywords
- A1. Crystal structure
- A3. Metalorganic vapor phase epitaxy
- B1. Nitrides
- B2. Semiconducting IIIV materials
- B3. Light emitting diodes
ASJC Scopus subject areas
- Condensed Matter Physics
- Inorganic Chemistry
- Materials Chemistry