3D patterning by means of nanoimprinting, X-ray and two-photon lithography

M. Tormen, L. Businaro, M. Altissimo, F. Romanato, S. Cabrini, F. Perennes, R. Proietti, Hong Bo Sun, Satoshi Kawata, E. Di Fabrizio^*

^*Corresponding author for this work

Research output: Contribution to journal › Conference article › peer-review