3D patterning by means of nanoimprinting, X-ray and two-photon lithography

M. Tormen, L. Businaro, M. Altissimo, F. Romanato, S. Cabrini, F. Perennes, R. Proietti, Hong Bo Sun, Satoshi Kawata, E. Di Fabrizio*

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

78 Scopus citations


Two lithographic techniques suitable for fabricating complex 3D structures with high spatial resolution are presented and discussed. The first one is based on the combined use of nanoimprint and X-ray lithography. Its technological potential has been demonstrated by patterning several types of structures with X-ray lithography on hexagonal array of hemispheres obtained previously by nanoimprinting. These consecutive steps give rise to an intersection-structure where the overall profile of high aspect ratio structures is enveloped by the original 3D imprinted profile. The second technique, two-photon lithography, is an intrinsic 3D lithography and has the highest potential for structuring 3D in the widest sense. The principle of this technology and experimental results in the field of nanomechanics and photonics will be presented.

Original languageEnglish (US)
Pages (from-to)535-541
Number of pages7
JournalMicroelectronic Engineering
StatePublished - Jun 2004
Externally publishedYes
EventMicro and Nano Engineering 2003 - Cambridge, United Kingdom
Duration: Sep 22 2003Sep 25 2003


  • 3D microstructures and nanostructures
  • Nanoimprint lithography
  • Two photon lithography
  • X-ray lithography

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering


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