3D microstructures fabricated by partially opaque X-ray lithography masks

S. Cabrini*, M. Gentili, E. Di Fabrizio, A. Gerardino, A. Nottola, Q. Leonard, L. Mastrogiacomo

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

10 Scopus citations


X-ray lithography has several advantages over optical or e-beam techniques, since x-ray proximity printing can overcome typical limitations of such techniques, enabling the imaging of ultra thick resist layers (micro-mechanical application). In this work we will discuss the fabrication of a multilevel x-ray mask capable of producing a radiation dose modulation when used in a typical proximity x-ray lithography set-up. The aim of our investigation is develop a process that in a single x-ray exposure can replicate a multilevel mask profile. The mask was realised by e-beam lithography and made by a number of overlapped gold layers, so producing a modulation of the x-ray dose absorption. We describe in some detail the process for the fabrication of the mask and the first result of the x-ray exposure.

Original languageEnglish (US)
Pages (from-to)599-602
Number of pages4
JournalMicroelectronic Engineering
Issue number1
StatePublished - Jun 2000
Externally publishedYes
Event25th International Conference on Micro- and Nano-Engineering - Rome, Italy
Duration: Sep 21 1999Sep 23 1999

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering


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