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Studies from King Abdullah University of Science and Technology (KAUST) in the Area of CMOS Technology Reported (Impact of Physical Stress On Gate Dielectric In Ultrathin Si Gate-stack for Next-generation Flexible Cmos Technology)
02/25/25
1 item of Media coverage
Press/Media: Press / Media
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Study Data from King Abdullah University of Science and Technology (KAUST) Update Understanding of Nanosheets (In-depth Dtco Analysis On Scaling Gate-all-around Nanosheets/nanowires for 20 A Node and Beyond Technologies)
Elatab, N., Das, U. K. & Ansari, M. H. R.
07/23/24
1 item of Media coverage
Press/Media: Press / Media