Material Science
Heterojunction
100%
Oxide Compound
75%
Nitride Compound
62%
Photosensor
41%
Single Crystal
37%
Magnesium Oxide
31%
Pulsed Laser Deposition
28%
Crystalline Material
27%
Sapphire
27%
Titanium
25%
Density
25%
Band Offset
22%
Lattice Mismatch
19%
Thin Films
19%
Al2O3
18%
Nucleation
16%
Epitaxy
14%
Lattice Constant
12%
Metal-Semiconductor Junction
12%
Film Growth
12%
Film
12%
X-Ray Diffraction
10%
Keyphrases
Deep Ultraviolet
37%
Photodetector
25%
Single Crystal Nickel
25%
Heterojunction
25%
Reverse Bias
18%
Responsivity
18%
Ga2O3
16%
Pulsed Laser Deposition
15%
MgO Substrate
12%
Electrical Characterization
12%
Incident Light
12%
Solar-blind
12%
Light Wavelength
12%
Interfacial Characteristics
12%
Epitaxial
12%
Single Domain
12%
Optical Characteristics
12%
Lattice Mismatch
12%
Aluminum Oxide
12%
Lattice Constant
12%
Ultra-low Power
12%
Nickel Oxide
12%
Lattice Strain
12%
MgO(100)
12%
Si(111)
12%
Titanium Nitride
12%
Oxide Nitride
12%
Ultraviolet Photodetection
12%
CMOS Integrated
12%
Engineering
Heterostructures
41%
Heterojunctions
40%
Nitride
37%
Photodetection
37%
Photodetector
33%
Lattice Mismatch
18%
Monocrystalline
16%
Reverse Bias
16%
Thin Films
16%
Optoelectronic Device
15%
Power Density
14%
Spectral Responsivity
14%
Band Offset
13%
Strain
12%
Si Interface
12%
Responsivity
12%
Lattice Constant
12%
Integrated Optoelectronics
12%
Band Gap
12%
High Resolution
10%
Light Incident
10%
Interlayer
10%