Metal Reactive Ion Etcher and Strip

  • Gheorghe Iordache (Manager)

Equipment/facility: Equipment

  • LocationShow on map

    King Abdullah University of Science and Technology Thuwal 23955

    Saudi Arabia

Equipments Details


Metal Reactive-ion etching - RIE - for substrates that can be chemically etched with chlorine and their compounds.
Model: Plasmalab 100 - ICP 380, up to 200mm


NameMetal Reactive Ion Etcher and Strip
Acquisition date04/1/10
ManufacturersOxford Instruments Group Plc


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