U.S. Patent and Trademark Office Publishes Institute of Microelectronics, Chinese Academy of Sciences's Patent Application for Method for Integrating Surface-Electrode Ion Trap and Silicon Photoelectronic Device, Integrated Structure, and Three-Dimensiona

Press/Media: Press / Media

PeriodMay 20 2021

Media coverage

1

Media coverage

  • TitleU.S. Patent and Trademark Office Publishes Institute of Microelectronics, Chinese Academy of Sciences's Patent Application for Method for Integrating Surface-Electrode Ion Trap and Silicon Photoelectronic Device, Integrated Structure, and Three-Dimensiona
    Media name/outletGlobal IP News. Semiconductor Patent News
    Country/TerritoryIndia
    Date05/20/21
    PersonsYan Li